Simulation Study of 4H-SiC High-k Pillar MOSFET With Integrated Schottky Barrier Diode

نویسندگان

چکیده

A SiC high-k (HK) split-gate (SG) MOSFET is proposed with a Schottky barrier diode (SBD) integrated between the split gates, and investigated by numerical TCAD simulation. Results show that it has same breakdown voltage as an optimized practical k value of 30 for its insulation pillar, which results in highest (1857 V). The forward (VF) reverse recovery charge (QRR) device are 0.9 V 3.49 μC/cm2 respectively, much lower than those HK due to SBD. Moreover, transfer capacitance (CRSS), smaller gate (QG), gate-to-drain (QGD) achieved because split-gates, leading switching power loss when compared MOSFET. All these indicate SG-MOSFET promising potential future electronics applications.

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ژورنال

عنوان ژورنال: IEEE Journal of the Electron Devices Society

سال: 2021

ISSN: ['2168-6734']

DOI: https://doi.org/10.1109/jeds.2021.3116715